Plasma Dicer APX300-DM
Plasma Dicer APX300-DM
The processing in APX300-DM uses a chemical reaction process with plasma, offering a clean processing without mechanical dust, debris, vibration, and water pressure caused by the existing blades.
- Single chamber configuration to find extensive applications ranging from research development to
mass-production. - Possible to continue dicing wafers of different materials in the same chamber without interruption.
( Si + Dielectric layer* ) - Capable of handling wafers with 200 / 300 mm ring frame.
*SiO2,SiN,etc
Features and Benefits of “Plasma Dicer APX300-DM”
Plasma dicing technology: An innovation in the method of separating the die from a wafer
Exhibition and Seminar Information
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